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硫化物晶体

    SbAsS3 三硫化砷锑晶体

    Our newest class of material: Sb2xAs2(1-x)S3 comes in perfect 1:1:3 stoichiometry consisting of Sb-Sb-S3 atoms. After 34 growth trials in a year, perfect stoichirometry, large single crystal domain size, minimal defect density (1 parts in 100,000 unit cells), and perfected purity level (99.9998%) are achieved. In the bulk form, antimony arsenic sulfide (SbAsS₃) is a direct gap semiconductor and has band-gap at around 1.7 eV. Similar to molybdenum disulfide, it has layered structure (lamellar) with weak interlayer coupling and can be isolated down to monolayers. The monolayer thickness measures ~0.8 nm and the monolayer SbAsS₃ is waiting to be discovered both experimentally and theoretically. Our crystals are large in size ~5-8mm and show remarkable PL characteristics.
     
    Our crystals are grown by state-of-the-art growth techniques over 8 weeks and show high crystallinity. Raman spectrum displays very sharp and clear modes with FWHM less than 6cm-1. Single crystal SbAsS₃ comes ready for exfoliation and is ideal for 2D research.

    Summary:
    Sb2xAs2(1-x)S3 alloys are created by alloying Sb into As2S3.
    Please specify your x value when ordering
    Space group: P21/c
    Layered: Yes / Exfoliates to monolayers
    Band gap: ~1.7 eV in bulk
    Purity: Semiconductor grade (6N) 99.9999%
    Growth technique: Vapor transport technique – Duration: 2.0 months
    Sample size: 5-10 mm

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